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产品名称
智能型PECVD系统（含压力控制系统）/Intelligent PECVD system with pressure control system
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Intelligent PECVD equipment is the latest type of equipment at present, which integrates all control parts into one. This kind of equipment is patented by our company in 2013.
智能PECVD设备是目前最新型的一款设备，将所有的控制部分集为一体，此款设备是我司在2013年获得专利的设备.
Can be equipped with PE RF power supply, CVD system upgrade to PECVD.
可配备PE射频电源，将CVD系统升级为PECVD.
When the atmosphere involved in the reaction enters the furnace tube under the action of radio frequency power to produce the ionizer, the reaction can be more adequate.
当参与反应的气氛进入炉管在射频电源的作用下产生离子体，可使反应更加充分.
At the same time, plasma plays an enhanced role, thus optimizing the technological conditions of the experiment to a great extent.
同时等离子体起增强的作用，从而很大程度上优化实验的工艺条件.
The slide track PECVD system developed by our company can make the entire experimental chamber in the glow generation area.
我公司研制的滑轨式PECVD系统能使整个实验腔体都处于辉光产生区.
The glow is uniform and equivalent, and this technique can solve the unstable state of traditional plasma.
辉光均匀等效，这种技术很好的解决了传统等离子工作不稳定状态.
In this way, the range and strength of ionization is one hundred times that of traditional PECVD, and the uneven accumulation of materials can be solved.
这样离子化的范围和强度是传统PECVD的百倍，并解决了物料不均匀堆积现象.
Compared with traditional CVD system, the growth temperature is lower.
与传统CVD系统比较，生长温度更低.
Use slide furnace to achieve rapid heating and cooling.
使用滑轨炉实现快速升温和降温.
The patented technology makes the whole tube glow uniform, equivalent, uniform growth.
设备特有的专利技术使得整管辉光均匀等效，均匀生长.
①High deposition rate: radiofrequency glow technology greatly improves the deposition rate of the film, which can reach 10A /S.
薄膜沉积速率高：射频辉光技术，大大的提高了薄膜的沉积速率，沉积速率可达10Å/S.
②High uniformity of large area: advanced multi-point RF feed technology, special gas distribution and heating technology is adopted, which makes the uniformity index of the film reach 8%.
大面积均匀性高：采用了先进的多点射频馈入技术，特殊气路分布和加热技术等，使得薄膜均匀性指标达到8%.
③High consistency: With the advanced design concept of the semiconductor industry, the deviation between the substrate at one deposition is less than 2%.
一致性高：用半导体行业的先进设计理念，使得一次沉积的各基片之间偏差低于2%.
④High process stability: highly stable equipment to ensure the continuity and stability of the process.
工艺稳定性高：高度稳定的设备保证了工艺的连续和稳定.
⑥Patent No.: ZL201320052532.0 (patented product, anti-counterfeiting must be investigated).
专利号：ZL201320052532.0 （专利产品，防伪必究）.
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Single temperature zone heating system 单温区加热系统 |
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Power supply 电源 |
The input voltage is single-phase 220V. 50/60 HZ 输入电压为单相、220V、50Hz Rated powe 3kw 额定功率 3kw |
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Maximum temperature 最高温度 |
1200℃ |
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Temperature of service 使用温度 |
≤1100℃ |
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Temperature Controller 控温方式 |
30 sections can be programmed temperature control, PID parameter self-tuning 30段可编程控温，PID参数自整定 Operation interface for 10 "industrial computer, built-in PLC control program 操作界面为10”工控电脑，内置PLC控制程序 The temperature control system and slide furnace sliding (time and distance) can be set as program control 可将温控系统、滑轨炉滑动（时间和距离）设定为程序控制 |
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Heating Zone 加热 |
Heating Zone Length:440mm 加热区长度：440mm Constant Temperature Zone: 200mm 恒温区长度：200mm Temperature Accuracy: +/- 1℃. 控温精度：+/- 1℃
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Effective furnace size 炉膛有效尺寸 |
Ф60*1650mm |
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Heating Elements 加热元件 |
Resistance wire, Fe-Cr-Al Alloy doped by Mo 电阻丝（掺钼铁铬铝合金） Type K thermocouple K型热电偶
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Furnace chamber material 炉膛材料 |
Alumina, high temperature fiber products 氧化铝、高温纤维制品
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PE radio frequency power supply PE射频电源 The CVD system can be equipped with PE RF power supply to upgrade the CVD system to PECVD. When the atmosphere involved in the reaction enters the furnace tube under the action of radio frequency power to produce the ionizer, the reaction can be more adequate. At the same time, plasma plays an enhanced role, thus optimizing the technological conditions of the experiment to a great extent. 该CVD系统可配备PE射频电源，将CVD系统升级为PECVD。当参与反应的气氛进入炉管在射频电源的作用下产生离子体，可使反应更加充分。同时等离子体起增强的作用，从而很大程度上优化实验的工艺条件。 |
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Frequency of signal 信号频率 |
13.56 MHz±0.005% |
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Power output range 功率输出范围 |
500W |
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Rf output interface 射频输出接口 |
50 Ω, N-type, female |
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Stability of power 功率稳定度 |
±0.1% |
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Component of harmonic wave谐波分量 |
≤-50dbc |
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Supply voltage 供电电压 |
Single-phase AC (187V-253V) frequency 50/60 Hz 单相交流（187V-253V） 频率50/60HZ |
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Efficiency of whole machine 整机效率 |
>=70% |
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Factor of power 功率因素 |
>=90% |
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Mode of cooling 冷却方式 |
Forced air cooling 强制风冷 |
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Five-way proton flow control system 五路质子流量控制系统 The gas supply system can control the mixing ratio of four kinds of gas according to different flow rates, and can also be equipped with gas washing device according to the experimental requirements. The mass flowmeter is installed in the sealed movable cabinet, which is composed of super clean double cast stainless steel pipe and precision double card sleeve joint, and is controlled by touch screen. 供气系统是一种可控制4种气体按不同流量进行混合配比，也可根据实验需求加装洗气装置，质量流量计安装于密封的可移动机柜内，由超洁双抛不锈钢管与精密双卡套接头连接组成，触摸屏控制。 |
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Connection header type 连接头类型 |
Double sleeve stainless steel connector 双卡套不锈钢接头 |
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Standard range 标准量程 |
氩气：1000sccm 氢气：300sccm 甲烷：100sccm 氮气：500sccm 氧气：100scc |
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Accuracy 准确度 |
±1.5% |
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Linear 线性 |
±0.5～1.5% |
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Repetition accuracy 重复精度 |
±0.2% |
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Response time 响应时间 |
Gas characteristics: 1 ~ 4 Sec, electrical characteristics: 10 Sec 气特性：1～4 Sec，电特性：10 Sec |
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Working pressure difference range 工作压差范围 |
0.1～0.5 MPa |
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Maximum pressure 最大压力 |
3MPa |
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Interface 接口 |
Φ6 or 1/4 "is optional Φ6或者1/4''可选 |
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Display 显示 |
4-digit display 4位数字显示 |
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Operating ambient temperature 工作环境温度 |
5~45 high purity gas 5~45高纯气体 |
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Pressure vacuum gauge 压力真空表 |
-0.1 ~ 0.15MPa, 0.01MPa/grid －0.1～0.15 MPa, 0.01 MPa/格 |
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Vacuum machine set 真空机组 The vacuum unit is internally equipped with a bipolar rotary vane mechanical pump, a set of capacitance vacuum gauge, and supporting corrugated pipes, manual flapper valves, clamps and other connecting parts. The cold limit vacuum of the equipment can reach 0.5Pa. 真空机组，内部安装双极旋片机械泵1台，电容真空计1套，并含有配套使用的波纹管，手动挡板阀，卡箍等连接部件。设备冷态极限真空可达0.5Pa。 |
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Operating voltage 工作电压 |
220V±10% 50~60HZ |
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Power 功率 |
1KW |
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Rate of air extraction 抽气速率 |
16m³/h |
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Ultimate vacuum 极限真空 |
0.5Pa |
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Air inlet diameter 进气口口径 |
KF25 |
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Exhaust port diameter 排气口口径 |
KF25 |
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Mode of connection 连接方式 |
The bellows are used, and the manual flapper valve is connected with the bellows 采用波纹管，手动挡板阀与波纹管相连
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Capacitance vacuum gauge 电容真空计 |
ZDM-I(with communication), can communicate with the touch screen ZDM-I(带通讯），可以和触摸屏通讯上 Vacuum gauge measuring range is optional from 5-5000pa 真空规管测量范围可选5-5000pa There is no need for coefficient conversion due to different gas types 不需因测量气体种类不同而需要系数转换 With high accuracy and repeatability, the response time is short 具有较高的精确度和重复性，响应时间较短 |
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Pressure control system 压力控制系统 |
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Main components 主要部件 |
Butterfly valve, pressure controller, capacitance vacuum gauge composition 蝶阀、压力控制器、电容真空计组成 |
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Effect 作用 |
According to the experimental requirements, add a butterfly valve (regulating valve) and a vacuum gauge between the outlet and the pump The vacuum gauge can detect the pressure in the pipe and adjust the opening size of the butterfly valve (regulator valve) through PLC 真空计可检测管内压力，通过 PLC 调节蝶阀（调节阀）开启的大小 To achieve the control pipe pressure unchanged 以达到控制管内压力不变 |
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Range of pressure 压力范围 |
100~100000Pa |
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Precision of control 控制精度 |
The measured value is ±5% 测量值±5% |
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双独立温场高温滑轨炉（High temperature slide furnace with double independent temperature field）
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